from the conferences organized by TANGER Ltd.
Microwave Plasma Enhanced Chemical Vapor Deposition (MWPECVD) is widely used for the growth and the study of synthetic doped diamond and its electronic and electrochemical applications. Recent results show the possible enhancement of dopant incorporation in diamond using pulsed gas injection in the reactor. Therefore, understanding the gas dynamic of the MWPECVD reactors is crucial to the optimization of the gas flows and diamond doping. In this work, we present a method to determine the gas dynamic response of a MWPECVD reactor. We determined the dynamic response of injected gas in a NIRIM type and a linear antenna type MWPECVD reactor by recording light emission from a hydrogen plasma during the instantaneous injection of a small fraction of nitrogen using either Optical Emission Spectroscopy (OES) or the combination of a photodiode and an optical band filter. Using linear system theory, we developed a program to determine the dynamic response of the reactor to an arbitrary shaped gas flow input from its pulse response.
Keywords: Pulse response, MWPECVD reactor, OES, gas dynamics, linear system theory© This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.