A SAMPLER OF DIFFRACTION AND REFRACTION OPTICALLY VARIABLE IMAGE ELEMENTS

1 HORÁČEK Miroslav
Co-authors:
1 KRÁTKÝ Stanislav 1 MATĚJKA Milan 1 CHLUMSKÁ Jana 1 MELUZÍN Petr 2 PIRUNČÍK Jiří 2 AUBRECHT Ivo 2 KOTRLÝ Marek 1 KOLAŘÍK Vladimír
Institutions:
1 Institute of Scientific Instruments of the CAS, v. v. i., Brno, Czech Republic, EU, *mih@isibrno.cz
2 Institute of Criminalistics of the Police of the Czech Republic, v. v. i., Prague, Czech Republic, EU
Conference:
13th International Conference on Nanomaterials - Research & Application, Orea Congress Hotel Brno, Czech Republic, EU, October 20 - 22, 2021
Proceedings:
Proceedings 13th International Conference on Nanomaterials - Research & Application
Pages:
436-441
ISBN:
978-80-88365-00-6
ISSN:
2694-930X
Published:
22nd November 2021
Proceedings of the conference were published in Scopus.
Metrics:
507 views / 257 downloads
Abstract

Diffraction and refraction optically variable image elements are basic building blocks of planar structures for advanced security of documents and valuables. A sampler formed by an array of 36 diffraction structures - binary, tertiary, quaternary and blazed gratings (period range 400 nm - 20,000 nm) - represents a cross-section throughout technological steps - mastering, galvanic replication and embossing. Electronbeam writing technology with Gaussian beam and electron energy of 100 keV, with very small forward scattering of high energy electrons and with the possibilities to create a linear grating with the minimal period of 100 nm, was used to create the master. An important advantage of highresolution electronbeam lithography is its substantial flexibility in combining possible planar structures with significantly different parameters, such as very dense and relatively shallow structures together with deep structures (approx. 10 microns) with precise shapes (microlenses or Fresnel structures). For protection of documents and valuables, interesting results are induced with planar optical structures consisting of non-periodic arrangements, which are characterized by high robustness to counterfeiting and imitation.While the origination process is available for grating period down to 100 nm, the mass replication technology appears to be a bottleneck of the entire technological process. Measurement of topology and profiles of the structures by atomic forces microscope and documenting the quality of technological process of the three steps of replication of planar optically variable elements was performed for all 36 structure types of sampler.

Keywords: Diffraction, refraction, optically variable image element, e-beam writer, mastering, galvanic replication, embossing, security, valuables

© This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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