ORGANOSILICON PLASMA POLYMERS DEPOSITED IN TRIMETHYLSILYL ACETATE/CH4 PLASMA OF CAPACITIVELY COUPLED RF GLOW DISCHARGE

1 Kelarová Štěpánka
Co-authors:
1 Stupavská Monika 1 Přibyl Roman 1 Buršíková Vilma
Institution:
1 Masaryk University, Faculty of Science, Brno, Czech Republic, EU, kelarova.s@mail.muni.cz
Conference:
12th International Conference on Nanomaterials - Research & Application, Brno, Czech Republic, EU, October 21 - 23, 2020
Proceedings:
Proceedings 12th International Conference on Nanomaterials - Research & Application
Pages:
535-540
ISBN:
978-80-87294-98-7
ISSN:
2694-930X
Published:
28th December 2020
Proceedings of the conference were published in Web of Science and Scopus.
Metrics:
616 views / 394 downloads
Abstract

Thin solid films based on organosilicon monomers are perspective in many branches of industry as well as for bioapplications. In the present study, plasma of RF capacitively coupled glow discharge in gaseous mixture of trimethylsilyl acetate (TMSA) monomer and methane was used to create SiOxCyHz coatings. This study monitors properties of resulting thin films (surface chemistry, wettability, surface structure and mechanical properties) in dependency on deposition parameters. The main subject of the presented research is the investigation of the relationship between the above-mentioned properties of prepared organosilicon coatings and the flow rate ratio of TMSA monomer and CH4 carrier gas applied during deposition process.

Keywords: Trimethylsilyl acetate, PECVD, XPS, microindentation, confocal microscopy

© This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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