from the conferences organized by TANGER Ltd.
In the present work we focused on the development of a low pressure capacitively coupled radio-frequency PECVD reactor for preparation of plasma-polymer thin films from organosilazane precursors. The dependence of the film growth from hexamethyldisilazane (HMDSZ, SiN2C6H19) and oxygen containing mixtures on the deposition parameters was studied. The time evolution of the negative self bias voltage on the thin film growth was studied. It was found, that the changes in the self bias voltage significantly influenced the surface structure and the properties of the growing films. The mechanical properties of the films were studied using nanoindentation technique and the surface structure was studied using atomic force microscopy (AFM).
Keywords: PECVD, nanoindentation, profilometry, confocal microscopy, AFM© This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.