from the conferences organized by TANGER Ltd.
<div>The DC-MS magnetron sputtering method is a well-known surface engineering technology and is a very effective technological tool in the processes of producing multi-component coatings. One of the limits of DC magnetron sputtering is the production of metal oxide coatings. Mainly due to the insulating properties of targets made of metal oxides. Currently, the most widely used type of magnetron sputtering, which enables deposition of metal oxides coating, is High Power Impulse Magnetron Sputtering (HPIMS) and Radio Frequence Magnetron Sputtering (RF-MS). This method is characterized by high power density, high ionization and high plasma density, which enables the production of high-quality multi-component coatings. As part of the presented work, the characteristics of the material and functional properties of MeO coatings produced with the use high-power pulsed magnetron sputtering (HPIMS) and radio frequence magnetron sputtering (RF-MS) and were carried out. The mechanical and material properties of the produced coatings were compared. The conducted analysis showed a significant influence of the applied technology on the deposition rate and mechanical properties of the obtained materials.</div>
Keywords: PVD, metal oxides coatings, magnetron sputtering, HIPIMS, RF-MS© This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.