INFLUENCE OF PROCESS PARAMETERS OF THE ION SOURCE ON THE HYDROPHILIC PROPERTIES OF POLYMERIC MATERIALS

1 PIASEK Artur
Co-authors:
1 KACPRZYŃSKA-GOŁACKA Joanna 1 SOWA Sylwia 1 OSUCH-SŁOMKA Edyta 1 ŁOŻYŃSKA Monika 1 SNOPCZYŃSKA Anita 2 KRASIŃSKI Andrzej 1 SMOLIK Jerzy
Institutions:
1 Łukasiewicz Research Network – Institute for Sustainable Technologies, Radom, Poland, EU, artur.piasek@itee.lukasiewicz.gov.pl
2 Faculty of Chemical and Process Engineering, Warsaw University of Technology, Warsaw, Poland, EU
Conference:
33rd International Conference on Metallurgy and Materials, Orea Congress Hotel Brno, Czech Republic, EU, May 22 - 24, 2024
Proceedings:
Proceedings 33rd International Conference on Metallurgy and Materials
Pages:
323-327
ISBN:
978-80-88365-21-1
ISSN:
2694-9296
Published:
26th June 2024
Proceedings of the conference have been sent to Web of Science and Scopus for evaluation and potential indexing.
Metrics:
76 views / 46 downloads
Abstract

Currently, polymers are a group of future-proof materials, which, in contrast metals, are characterized by low weight and also are easier to obtain and relatively cheap. However, due to their low surface energy, their use is often limited. Due to plasma technology, it is possible to modify the surface properties of polymers in a cost-effective and efficient way. During the last years, low temperature plasma surface functionalization of polymer materials has increasingly earned a high position in a wide range of application fields. This paper present the influence of ion etching technology on modyfication of the surface of polymers. An assessment of the impact of the operating parameters of the ion gun on the hydrophilic properties of polymers was presented. An analysis of the surface topography, chemical composition and wettability of polymer materials after the activation process was carried out.

Keywords: Polymer, plasma treatment, ion etching, hydrophilic properties of polymers.

© This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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